Treatment of semiconductor devices using deuterium oxide

Fig 1.Deuterium oxide can be used to treat semiconductor devices

 

Deuterium oxide or heavy water is used in the production of deuterium gas, a form of naturally occurring pure hydrogen. Chemical formula of deuterium gas is ²H₂ or D₂ and its pure form is rarely seen in the nature.

Deuterium (D₂) and deuterium-substituted gases are used in the manufacture of silicon semiconductors and microchips through the process of deuterium-protium exchange.

Semiconductor device annealing process with deuterium at super atmospheric pressures reduces of the effects of hot carrier stress and improves the operating characteristics. This significantly enhances the life cycle of semiconductors and microchips. It enables chips to be made smaller, have high circuit densities and have a longer life cycle.

 

Source:

https://www.google.com/patents/US6833306